• Management: Environmental Management
  • Energy: Initiatives in the Energy-related Fields
  • Eco Products: Environmentally Conscious Products
  • Eco Processes: Environmental Considerations in Business Operations
  • Eco Programs: Communication with Stakeholders

Greenhouse Gases other than CO₂

Reducing emissions of greenhouse gases other than CO2

Toshiba Group aims to reduce the emissions of six types of greenhouse gases covered by the Kyoto Protocol* by 36% by FY2010 and 38% by FY2012, to 62% of the FY2000 level. In particular, it is taking measures to replace SF6, PFC, and HFC, all of which have high greenhouse effects, with gases with low global warming potential and introduce greenhouse gas removal systems into existing and newly built production lines.

In FY2008, emissions of greenhouse gases other than CO2 declined substantially because Toshiba Group accelerated the installation of greenhouse gas removal systems in existing production lines and because there was a decrease in the production of semiconductors and liquid crystal devices. It is expected that emissions of these gases will grow next year and thereafter as business expands, but Toshiba Group aims to attain the goals by installing greenhouse gas removal systems and improve the efficiency of greenhouse gas removal.

*
The six types of greenhouse gases whose emissions must be reduced under the Kyoto Protocol are carbon dioxide (CO2), methane (CH4), nitrous oxide (N2O), hydrofluorocarbons (HFCs), perfluorocarbons (PFCs), and sulfur hexafluoride (SF6).

Changes in emissions of greenhouse gases other than CO2

graph of Changes in emissions of greenhouse gases other than CO₂

Breakdown of emissions of greenhouse gas other than CO2 (FY2008)

chart of Breakdown of Non-CO₂ Greenhouse Gas Emissions by Business Segment (FY2008)
chart of Breakdown of Non-CO₂ Greenhouse Gas Emissions by Region (FY2008)

Case Study: Reducing emissions of greenhouse gases (other than CO2) / Fuchu Operations, Toshiba Corporation

The Fuchu Operations had used SF6 (whose global warming potential is 23,900 times as high as CO2) for vacuum valve testing systems, but reduced greenhouse gas emissions by 65% by developing a testing system that uses an alternative to the greenhouse gas. It was recognized by the Tokyo metropolitan government as an excellent business site for this accomplishment.

graph of Changes in CO₂ emissions from Fuchu Operations

Changes in CO2 emissions from Fuchu Operations

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Case Study in FY2007

Case Study: Novel Environmentally Conscious Process at State-of-the-Art Low-temperature Polysilicon LCD Plant in Japan

Toshiba Matsushita Display Technology Co., Ltd. has developed a fluorine (F2) gas-based cleaning process for the low-temperature polysilicon TFT LCD production line at its Ishikawa Works.

Previously, the company used nitrogen trifluoride (NF3), which was delivered in cylinders by a supplier. The newly installed system involves on-site production of F2 gas. As a result, CO2 emissions from the cleaning process, which could not be entirely eliminated in the case of NF3 gas even with the use of scrubbers, have been eliminated. Also, the on-site production of gas has lowered costs.

This is the first on-site F2 gas production system in Japan at an LCD or semiconductor manufacturing plant.

figure of Novel Environmentally Conscious Process at State-of-the-Art Low-temperature Polysilicon LCD Plant in Japan