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2009

Nov. 2009

  • Toshiba develops molecular photoresist technology for EUV lithography (Nov. 2009) Tokyo-Toshiba Corporation (TOKYO: 6502) today announced that it has developed a high resolution photoresist (photo-sensitive film) essential for future application of EUV (extreme ultraviolet) lithography in semiconductor fabrication, and proved its viability with the world's first 20nm-scale generation process technology. This achievement will be announced at 22nd International Microprocesses and Nanotechnology Conference on November 19.