History

History
Year Month History
1981 Apr.
  • Established under the name Toshiba Microcomputer Engineering Co., Ltd.
    Capital: ¥50 million;
    Head Office: 1 Komukaitoshiba-cho, Saiwai-ku, Kawasaki-shi, Kanagawa
  • Launched LSI pattern designing and digitizing, and mask generation data processing.
1984 Nov.
  • Increased capital to ¥150 million
Dec.
  • Increased capital to ¥300 million
1987 Apr.
  • Relocated to 25-1 Ekimaehoncho, Kawasaki-ku, Kawasaki-shi, Kanagawa.
  • Launched production engineering business.
1989 Apr.
  • Renamed under the current name of Toshiba Microelectronics Corporation
1996 Apr.
  • Opened Yokkaichi office (Yokkaichi City, Mie).
  • Launched memory failure analysis business.
  • Moved microcomputer sales engineering and application software development arms to Toshiba LSI System Support Co., Ltd, and moved the documentation business to Toshiba Documents Corp.
1998 May
  • Increased capital to ¥500 million.
1999 Jan.
  • Moved CISC microcomputer business to Toshiba LSI System Support Co., Ltd
  • Inherited physical analysis business from Toshiba.
2000 Jan.
  • Gained ISO 9001 certification
Oct.
  • Inherited semiconductor business from Toshiba Digital Media Engineering Corporation.
2001 Apr.
  • Moved automobile business to Toshiba LSI System Support Co., Ltd.
Oct.
  • Moved discrete business to Toshiba LSI System Support Co., Ltd.
  • Organized the Reliability Testing Department as an internal company and reorganized to Nanotex Corporation.
2002 Aug.
  • Established Toshiba Nanoanalysis Corp. through joint company split with Toshiba Electronic Engineering Corporation.
    Toshiba Nanoanalysis received the sales business from Nanotex Corporation.
2003 Oct.
  • History of Toshiba Discrete Semiconductor Technology Corporation
  • Established under the name Toshiba Discrete Semiconductor Technology Co., Ltd.
  • Capital: ¥20 million;
  • Head Office: 580 Horikawa-cho, Saiwai-ku, Kawasaki City, Kanagawa
  • Launched discrete semiconductor designing and sales engineering.
2004 Feb.
  • History of Toshiba Discrete Semiconductor Technology Corporationn
  • Gained ISO 9001 certification
2008 Jul.
  • Inherited microcomputer business from Toshiba LSI System Support Co., Ltd (currently Toshiba Memory Systems Co., Ltd.) and split off the memory business, including the Yokkaichi office, from Toshiba Microelectronics Corporation.
Aug.
  • History of Toshiba Discrete Semiconductor Technology Corporation
  • Gained ISO 14001 certification
    (joint certification with Toshiba Corporation Semiconductor Company)
2009 Sep.
  • Gained ISO 14001 certification
  • (joint certification with Toshiba Corporation Semiconductor Company)
Oct.
  • History of Toshiba Discrete Semiconductor Technology Corporation
  • Inherited semiconductor assembly process technology development business and discrete semiconductor manufacturing equipment development business from Toshiba Components Corporation.
2010 Nov.
  • History of Toshiba Discrete Semiconductor Technology Corporation
  • Moved head office to Microelectronics Centor, current Komukai Operations, of Toshiba Corporation.
2013 Sep.
  • Transferred image sensor business to Toshiba Memory Systems Co., Ltd.
2015 Aug.
  • Relocated to Solid Square East Tower 9F, 580, Horikawa-cho, Saiwai-ku, Kawasaki-shi, Kanagawa.
2017 Apr.
  • Transferred memory evaluation and analysis business to Toshiba Memory Systems Co., Ltd.
Dec.
  • Nexty Electronics and Toshiba Microelectronics Establish Software Development Joint Venture
2018 Apr.
  • Transferred CAD business to Toshiba Memory Systems Co., Ltd.
2019 Apr.
  • Renamed as Toshiba Electronic Device Solutions Corporation, merging Toshiba Discrete Semiconductor Technology Corporation and Toshiba Microelectronics Corporation
Oct.
  • Relocated to 580-1 Horikawa-cho, Saiwai-ku, Kawasaki-shi, Kanagawa.
2022 Apr.
  • Merged Toshiba Semiconductor Service & Support Co., Ltd.
2024 Feb.
  • Relocated to 1 Komukai-toshiba-cho, Saiwai-ku Kawasaki-shi, Kanagawa 212-8583, Japan
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